Directed assembly of micro and nanostructures wikipedia. Recently directed self assembly dsa has emerged as a promising lithography technique candidate for cut manufacturing because of its ability to form small cylinders inside the guiding templates and the actual pattern size can be greatly reduced. Process flow of combining directed selfassembly dsa and selfaligned double patterning sadp approaches to reach a total pitch scaling factor of 8. Contact hole shrink process using graphoepitaxial directed. Lithographically directed selfassembly of nanostructures. Directed selfassembly lithography using coordinated line. I abstract tampere university of technology masters degree programme in science and engineering karjalainen, hertta.
For a system with numerical aperture na and wavelength. The materials and methods to prepare them merge bottomsup selfassembly with topdown patterning. Directed selfassembly of block copolymers for next generation nanolithography. Block copolymer directed selfassembly is an attractive method to fabricate highly uniform nanoscale features for various technological applications, but the dense periodicity of block copolymer. We present a method to direct the self assembly of pspmma block copolymer by surface chemical modification using atomic force microscopy afm based nanolithography. Combining double patterning with selfassembled block copolymer. Dsa has shown the capability for pitch reduction multiplication, hole shrinks, cd self healing as well as a pathway towards line edge roughness ler and pattern collapse improvement 14. We control the binary states by creating openings around the confinement, changing the confinement geometry, or placing lithographic guiding. Imec boosts directed selfassembly lithography process. Lithography precise, but expensive and difficult at small sizes merge bottomsup selfassembly with topdown patterning.
Directed selfassembly dsa dsa is a bridge between topdown and bottomup patterning can leverage existing patterning methods two possible goals for dsa. Directed selfassembly based cut mask optimization for. Directed selfassembly of block copolymers for nanolithography. New device architecture, immersion lithography, negativetone development, multiple patterning, and directed selfassembly have demonstrated the capabilities of extending lithography nodes beyond what anyone thought would be possible. Directed selfassembly dsa of nanoscale devices commonly combines selfassembling materials such as block copolymers bcps with lithographically defined prepatterned surfaces. A simulation analysis on defect annihilation in directed self.
Nanospheres lithography nsl is a manufacturing technique based on the selfassembly sa process of colloidal spheres 1. Directed self assembly of block copolymers for next generation nanolithography. Provided are methods of fabricating thin film structures that involve assembling block copolymer materials in the presence of condensed phase surfaces on both sides of the thin film, at least one of which is a chemically patterned surface configured to direct the assembly of the block copolymer material. The ability to transform matter that displays novel physics and properties into useful materials and devices is indivisibly linked to the ability to reliably control structure on length scales of interest. Directed assembly of micro and nanostructures are methods of massproducing micro to nano devices and materials. Combining lithography and directed self assembly for the. Directed selfassembly dsa is a potential candidate to. A simulation analysis on defect annihilation in directed self assembly lithography katsuyoshi kodera, hideki kanai, yuriko seino, hironobu sato, yusuke kasahara, katsutoshi kobayashi, hiroshi kubota, naoko kihara, yoshiaki kawamonzen, shinya minegishi, ken miyagi, toshikatsu tobana, masayuki shiraishi, satoshi nomura and tsukasa azuma.
However, because microelectronic devices use freeform design principles, the insertion point of selfassembling materials into existing nanomanufacturing processes is unclear. New material advancements for future technology nodes are proposed. Approach does not employ traditional resist based lithography to define the pattern, thereby reducing the processing steps and manufacturing costs. Strategies for integration of directed selfassembly with. The premise is that a single lithographic exposure may not be enough to provide sufficient resolution.
Self assembly is an effective strategy for the creation of periodic structures at the nanoscale. Various advanced directed self assembly approaches are examined, in which block copolymer self assembly is synergistically integrated with conventional photolithography, such as arf lithography or iline lithography, via either epitaxial self assembly or the graphoepitaxy principle. Combining double patterning with selfassembled block. Recently, directed self assembly dsa has emerged as a promising lithography solution for cut manufacturing. Directed self assembly of block copolymers has received a great deal of research attention as a promising nanolithography to complement the intrinsic limitations of conventional photolithography. Flexible and precise dsa control of 25 nm contact holes guided by 66 nm templates for industry. Lithographically directed selfassembly of nanostructures j. We perform a comprehensive study on the dsa aware mask optimization problem to provide.
Directed selfassembly lithography using coordinated line epitaxy cool process. Simultaneous template optimization and mask assignment for dsa with multiple patterning 1 jian kuang. Directed self assembly lithography dsal is a highly promising patterning solution in sub7nm technology. Directed self assembly materials for semiconductor lithography. By combining tailored selfassembly processes a bottomup approach with. Nanoelectronics research institute imec leuven, belgium is presenting details on improvements in directed self assembly dsa process development at this weeks spie advanced lithography conference, being held in san jose, calif. Hierarchical nanoparticle ensembles synthesized by liquid. Directed selfassembly and pattern transfer of five nanometer.
Lithographically directed self assembly of nanostructures j. The chapter first discusses block copolymer lithography to realize the full potential of selfassembled structure. In modern semiconductor manufacturing, photolithography uses optical radiation to image the mask on a silicon wafer using. Among all the emerging patterning approaches, block copolymer directed selfassembly dsa is a promising candidate with high throughput and low cost for sub20 nm features. Directed self assembly dsa dsa is a bridge between topdown and bottomup patterning can leverage existing patterning methods two possible goals for dsa. The method of block copolymer dsa most commonly used for contact and via patterning uses. Method of forming sublithographic features using directed. Towards reliable directed selfassembly lithography for. The process itself goes back to 1796 when it was a printing method using ink, metal plates and paper. Directed self assembly materials for semiconductor lithography shinya minegishi, takehiko naruoka and tomoki nagai fine electronic research laboratories semiconductor materials laboratory jsr corporation 100, kawajiricho, yokkaichi mie 5108552 japan the directed self assembly dsa method is becoming a key complementary technology for. Directed assembly allows the accurate control of assembly of micro and nano particles to form even the most intricate and highly functional devices or materials. Publishers pdf, also known as version of record includes final page. Directed selfassembly dsa has the potential to extend scaling for both linespace and hole patterns. Alternative patterning technology makes incremental gains, but the big money is still behind euv.
Multiple lithography method for directed materials assembly. Directed selfassembly of block copolymers has received a great deal of research attention as a promising nanolithography to complement the intrinsic. Characterization of directed selfassembly patterns in. Physical design and mask synthesis for directed self.
Nanomanufacturing using self assembly may hold the solution to this hurdle. Directed self assembly of block copolymers is a scalable method to fabricate wellordered patterns over the wafer scale with feature sizes below the resolution of conventional lithography. Apr 18, 2019 directed self assembly dsa is an emerging technology that has the ability to substantially improve lithographic manufacturing of semiconductor devices. Na would not be resolvable in a single wafer exposure. Multiple patterning or multipatterning is a class of technologies for manufacturing integrated circuits ics, developed for photolithography to enhance the feature density.
According to various embodiments, the other of the condensed phase. The directed selfassembly dsa and pattern transfer of. Sigmaaldrich products are sold exclusively through sigmaaldrich, inc. May 19, 2016 directed self assembly dsa was until recently a rising star in the nextgeneration lithography ngl landscape, but the technology has recently lost some of its luster, if not its momentum. Directed selfassembly of block copolymers for use in bit patterned. The thin film directed selfassembly of molecular building blocks into oriented. Directed selfassembly of polystyrene nanospheres by. Dec 16, 2014 block copolymer directed self assembly is an attractive method to fabricate highly uniform nanoscale features for various technological applications, but the dense periodicity of block copolymer. The most obvious case requiring multiple patterning is when the feature pitch is below the resolution limit of the optical projection system. Sub10nm patterning via directed selfassembly of block. Pattern orientation control for directed self assembly lithography a block copolymer consisting of two segregated polymer blocks linked by a chemically covalent bond forms self assembled nanometerscale patterns, whose size does not depend on a lithographic exposure tool but on the molecular weight. In dsa, copolymer materials self assemble to form nanoscale resolution patterns on the semiconductor substrate.
Create longrange order in the selfassembled structures align structures to existing patterns on the substrate two approaches to dsa fieldguided selfassembly. In this paper, we perform a comprehensive study on the dsa cut mask optimization problem. Starting at the upper left, a chemical pattern is fabricated on a silicon substrate coated with a layer of spinon carbon soc and a layer of spinon glass sog. A simulation analysis on defect annihilation in directed. These structures can be further harnessed as templates to build novel materials such as metallic nanostructures, which are widely used and explored because of their unique optical properties and their potency to serve as components. Simple and versatile methods to integrate directed self assembly with optical lithography using a polarityswitched photoresist. Modeling of block copolymer dry etching for directed selfassembly lithography zelalem beletea, eberhard baerb, andreas erdmanna b afriedrichalexanderuniversity of erlangennuremberg, chair of electron devices, cauerstrasse 6, 91058 erlangen, germany bfraunhofer institute for integrated systems and device technology, schottkystrasse 10, 91058 erlangen, germany. Optimizing the production time and costs in this new process entails minimizing the number of lithography steps, which constitutes a generalization of graph coloring. Pany yece department, university of texas at austin, austin, tx usa zglobalfoundries inc, santa clara, ca usa. Directed assembly of block copolymer blends into nonregular.
Nanoelectronics research institute imec leuven, belgium is presenting details on improvements in directed selfassembly dsa process development at this weeks spie advanced lithography conference, being held in san jose, calif. Neutral layer material filtration for directed self assembly. Thermal scanning probe lithography for the directed self. Strategies for integration of directed selfassembly with optical lithography. At the 10 nm technology node, the contact layers of integrated circuits ic designs are too dense to be printed by single exposure using 193 nm immersion 193i lithography. Modeling of block copolymer dry etching for directed self.
One such example is the self assembly of the lipid bilayer membrane in cells. Usa home product directory materials science micronanoelectronics self assembly and lithography photoresists. Among these, directed self assembly dsa of block copolymers stands out as a lowcost and highthroughput method for patterning sub20 nm features in integrated circuits 2. Block copolymer directed selfassembly dsa aware contact. Directed selfassembly contactvia manufacturing promising next generation lithography for 10nm. Directed selfassembly based cut mask optimization for unidirectional design jiaojiao ouy, bei yuy, jhihrong gaoy, moshe preilz, azat latypovz, david z. Dsa has shown the capability for pitch reduction multiplication, hole shrinks, cd selfhealing as well as a pathway towards line edge roughness ler and pattern collapse improvement 14. Figures 27 and 28 were changed in the online pdf to match the full text html. Pattern scaling with directed self assembly through. Directed self assembly dsa has the potential to extend scaling for both linespace and hole patterns. Here, we detail recent advances in the preparation of pixelated polymers prepared by the directed selfassembly of liquid crystalline monomers to yield crosslinked polymer networks liquid crystalline polymer networks, lcn, or liquid crystalline elastomers, lce. Pattern orientation control for directed selfassembly lithography a block copolymer consisting of two segregated polymer blocks linked by a chemically covalent bond forms selfassembled nanometerscale patterns, whose size does not depend on a lithographic exposure tool but on the molecular weight. Here we demonstrate a nanosphere lithography based technique for fabricating large area, well. We directed ternary blends of diblock copolymers and homopolymers that naturally form periodic arrays to assemble into.
This book discusses physical design and mask synthesis of directed selfassembly lithography dsal. Nanospheres lithography nsl is a manufacturing technique based on the self assembly sa process of colloidal spheres 1. Combining directed self assembly of block copoly mers with soft lithography. Extending lithography with advanced materials 905140. Directed self assembly dsa of the domain structure in block copolymer bcp thin films is a promising approach for sub10nm surface patterning. Nanosphere lithography based technique for fabrication of. Molecular selfassembly 1 is the assembly of molecules without guidance or management from an outside source. Filtration on block copolymer solution used in directed.
In dsa, copolymer materials selfassemble to form nanoscale resolution patterns on the semiconductor substrate. In this paper, we investigate the manufacturing of vias in integrated circuits with a new technology combining lithography and directed self assembly dsa. An efficent approach to molecular self assembly having received ample attention during the last decade is the creation of self assembled. However, because microelectronic devices use freeform design principles, the insertion point of self assembling materials into existing nanomanufacturing processes is unclear. Recently directed selfassembly dsa has emerged as a promising lithography technique candidate for cut manufacturing because of its ability to form small cylinders inside the guiding templates and the actual pattern size can be greatly reduced. To date, the most significant impact of dsa has been for the fabrication of. Recently, directed selfassembly dsa has emerged as a promising lithography solution for cut manufacturing. Directed self assembly dsa technology has emerged as a promising candidate for cut printing in advanced 1d gridded layouts, where cuts might need to be redistributed such that they can be. Directed selfassembly dsa is an emerging technology that has the ability to substantially improve lithographic manufacturing of semiconductor devices. Physical design and mask synthesis for directed selfassembly. Photoresists self assembly and lithography sigmaaldrich. Directed selfassembly dsa technology has emerged as a promising candidate for cut printing in advanced 1d gridded layouts, where cuts might need to be redistributed such that they can be. Directed selfassembly of block copolymers for next. In modern semiconductor manufacturing, photolithography uses optical radiation to.
Directed selfassembly of block copolymer films on atomicallythin. By sem observation of alignment errors between the trenches and connect spaces, overlay shift patterns 4 nm in guide lithography mask were fabricated without intrawafer alignment errors. Directed assembly is a promising nanolithography to produce a complex structure with small feature size. Neutral layer material filtration for directed self.
Directed assembly of the pspmma ternary blend into isolated segment structures. Alexander liddlea materials sciences division, lawrence berkeley national laboratory, room 2419, 1 cyclotron road, berkeley, california 947208232 yi cui and paul alivisatos department of chemistry, university of california, berkeley,california and materials sciences division. Full text pdf 716k abstracts references6 besides block copolymer, gel defects in neutral layer is another concern in directed self assembly lithography. We directed ternary blends of diblock copolymers and homopolymers that naturally. In our approach, a psoh brush layer is chemically modified by the afm tip, creating a nanometer scale guiding pattern that induces the alignment of the block copolymer. Dippen nanolithography dpn is a direct write lithographic technique that uses an atomic force microscope afm to build a pattern on the substrate material rather than etching it. Dsa of bcp is a viable bottomup technique that enables the fabrication of structure widths ranging from 5 to 50nm. Cheng jy, sanders dp, truong hd, harrer s, friz a, holmes s, colburn m, and hinsberg wd. An efficent approach to molecular selfassembly having received ample attention during the last decade is. It covers the basic background of dsal technology, physical design optimizations such as placement and redundant via insertion, and dsal mask synthesis as well as its verification. Filtration on block copolymer solution used in directed self assembly lithography toru umeda, tomoyuki takakura and shuichi tsuzuki nihon pall ltd.
Directed selfassembly dsa was until recently a rising star in the nextgeneration lithography ngl landscape, but the technology has recently lost some of its luster, if not its momentum. To find appropriate filtration, we studied gel reduction in neutral layer materials. Modeling of block copolymer dry etching for directed self assembly lithography zelalem beletea, eberhard baerb, andreas erdmanna b afriedrichalexanderuniversity of erlangennuremberg, chair of electron devices, cauerstrasse 6, 91058 erlangen, germany. Directed selfassembly of a twostate block copolymer system nano. The chapter first discusses block copolymer lithography to realize the full potential of self assembled structure.
Lithography is the transfer of geometric shapes on a mask to a smooth surface. Directed selfassembly of block copolymers has received a great deal of research attention as a promising nanolithography to complement the intrinsic limitations of conventional photolithography. Besides block copolymer, gel defects in neutral layer is another concern in directed self assembly lithography. Block copolymer directed selfassembly bcp dsa is the leading candidate for. One such example is the selfassembly of the lipid bilayer membrane in cells. Us9718250b2 directed assembly of block copolymer films. Approach is possibly the only viable method to produce sub22 nm based integrated circuits without the use of directed self assembly. Selfassembly materials self assembly and lithography. Mask assignment and synthesis of dsamp hybrid lithography for sub7nm contactsvias, in proc.
Selfassembly is an effective strategy for the creation of periodic structures at the nanoscale. Considering the rising cost of optical lithography tools, alternative. Create longrange order in the self assembled structures align structures to existing patterns on the substrate two approaches to dsa fieldguided self assembly. It is expected to be necessary for the 10 nm and 7 nm node semiconductor processes and beyond. Programmable selfassembly of nucleic acids enables the fabrication of custom, precise objects with nanoscale dimensions. Lithography precise, but expensive and difficult at small sizes self assembly of. Simultaneous template optimization and mask assignment. Pattern orientation control for directed selfassembly. Finally, simple manual shearing of a sample between 2 glass slides is often useful. Further characterization and data for materials and processes used in this study pdf.
Directed selfassembly cut mask assignment for unidirectional. Directed self assembly based cut mask optimization for unidirectional design jiaojiao ouy, bei yuy, jhihrong gaoy, moshe preilz, azat latypovz, david z. Block copolymer multiple patterning directed selfassembly. Plasmonic nanostructures through dnaassisted lithography. Pdf directed selfassembly of block copolymers for next.
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